退火温度对TiO<sub>2</sub>及Nb掺杂TiO<sub>2</sub>薄膜的影响

退火温度对TiO₂及Nb掺杂TiO₂薄膜的影响

摘要: 采用溶胶-凝胶法在普通载玻片上制备了均匀透明的TiO₂薄膜和掺Nb的TiO₂薄膜, 利用XRD, UV-VIS等手段, 研究了退火温度对薄膜的结构、紫外-可见光区透射率、光学禁带宽度等性质的影响, 并分析了掺杂Nb对TiO₂薄膜晶体结构和光学性能的影响。实验结果表明: 退火温度越高, 薄膜生长取向越好, 晶粒尺寸越大, 光透过率越低; 掺杂Nb后, 能明显改善其结晶与生长, 并降低其晶粒尺寸, 透射率光谱吸收边缘产生蓝移现象。

Abstract: TiO₂ films and Nb-doped TiO₂ films were prepared on glasses by Sol-Gel method.The influence of annealing temperature on the structure, optical transparency, optical band gap and other properties of the films was researched by XRD, UV-VIS and other equipments.The influence of doping Nb on various aspects of properties of the TiO2 film was analyzed.The results showed that the higher annealing temperature, the better growth orientation, the bigger grain size, and the lower optical transparency of the film would be obtained.The doping Nb could significantly improve the crystallization and growth of the film, it also could reduce the grain size of TiO₂ films, and the UV absorption had the blue shift phenomenon.