1673-159X

CN 51-1686/N

用高温氧化法制备氧化镍纳米线及氧化机制研究

Research on Oxidation Mechanism and Fabrication of Nickel Oxide Nanowires via High Temperature Oxidation

  • 摘要: 为获得晶粒尺寸可控的氧化镍(NiO)纳米线,用高温氧化法制备NiO纳米线,并通过XRD、SEM、TGA和HRTEM的手段分析氧化机制。微结构分析表明,Ni纳米线在400、600、800 ℃氧化5 h获得的NiO纳米线的平均晶粒尺寸分别为12、16、21 nm,说明随着氧化温度的升高,晶粒尺寸增大。SEM分析显示,NiO纳米线的长度(150 μm)与直径(150 nm)和Ni纳米线一致,但NiO纳米线的表面更为光滑,直线度更好。通过TGA和HRTEM分析可知,Ni纳米线到NiO纳米线的高温氧化必经历一个无定型的氧化过程。

     

    Abstract: In order to obtain nickel oxide (NiO) nanowires with controllable grain size, a method to fabricate NiO nanowires via high temperature oxidation is presented, and the specific oxidation mechanism is investigated with XRD, SEM, TGA and HRTEM approaches. Microstructure characterization indicate that the average grain sizes of NiO nanowires are about 12nm (400℃, 5 h), 16 nm (600℃, 5 h), 21 nm (800℃, 5 h), respectively, which illustrate that the average grain sizes of the NiO nanowires are getting bigger with the increase of oxidation temperature. Through the SEM analysis, NiO nanowires have similar length (150 μm) and diameter (150 nm) with the Ni nanowires. However, NiO nanowires have more smooth surface and straightness. TGA curves and HRTEM images indicate that the high temperature oxidation process from Ni nanowires to NiO nanowires must undergo a process of an amorphous oxidation.

     

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